Quantum conductance of point contacts in Si inversion layers
- 15 November 1992
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 46 (19) , 12873-12876
- https://doi.org/10.1103/physrevb.46.12873
Abstract
We have performed electron-transport studies on high-mobility Si inversion layers in which a narrow and short constriction is defined electrostatically. When the width of the constriction is varied, steplike structures in the conductance are observed with a spacing of approximately 4/h in zero magnetic field and at a temperature of 1.2 K. In the presence of a magnetic field these features develop into quantum Hall plateaus and the fourfold degeneracy is lifted. We argue that this behavior arises from the depopulation of successive one-dimensional subbands in the constriction.
Keywords
This publication has 13 references indexed in Scilit:
- Mobility modulation in a quasi-one-dimensional Si-MOSFET with a dual-gate structureIEEE Electron Device Letters, 1992
- Coulomb-blockade oscillations in the conductance of a silicon metal-oxide-semiconductor field-effect-transistor point contactPhysical Review B, 1991
- One-dimensional subband effects in the conductance of multiple quantum wires in Si metal-oxide-semiconductor field-effect transistorsPhysical Review B, 1990
- One-dimensional transport and the quantisation of the ballistic resistanceJournal of Physics C: Solid State Physics, 1988
- Quantized conductance of point contacts in a two-dimensional electron gasPhysical Review Letters, 1988
- Magnetic Depopulation of 1D Subbands in a Narrow 2D Electron Gas in a GaAs:AlGaAs HeterojunctionPhysical Review Letters, 1986
- Quasi One-Dimensional Conduction in Multiple, Parallel Inversion LinesPhysical Review Letters, 1986
- Magnetoconductance and quantized confinement in narrow silicon inversion layersSurface Science, 1984
- Can a length of perfect conductor have a resistance?Physics Letters A, 1981
- Spatial Variation of Currents and Fields Due to Localized Scatterers in Metallic ConductionIBM Journal of Research and Development, 1957