Ion plating by field emission deposition
- 17 December 1979
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 64 (3) , 471-478
- https://doi.org/10.1016/0040-6090(79)90334-1
Abstract
No abstract availableKeywords
This publication has 26 references indexed in Scilit:
- Molecular beam epitaxy and field emission deposition for metal film growth on III–V compound semiconductors—A comparative studyThin Solid Films, 1979
- Field emission deposition sourcesThin Solid Films, 1979
- Electrostatic-spray theoryJournal of Applied Physics, 1978
- Carburation enhancement in an internal combustion engine by electrostatic atomisation of petrolJournal of Physics D: Applied Physics, 1978
- Positive Particle Beam Deposition of Some Metallic FilmsJapanese Journal of Applied Physics, 1977
- The electrical dispersion of liquids as aerosolsJournal of Colloid Science, 1955
- Production of monodisperse liquid particles by electrical atomizationJournal of Colloid Science, 1952
- Electrical Discharges from Pointed ConductorsPhysical Review B, 1920
- Instability of Electrified Liquid SurfacesPhysical Review B, 1917
- The Electrical Discharge from Liquid Points, and a Hydrostatic Method of Measuring the Electric Intensity at Their SurfacesPhysical Review B, 1914