Dependence of structural and compositional characteristics of chromium metal films as a function of deposition rate during the fabrication of metal/insulator/semiconductor solar cells
- 1 July 1985
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 129 (1-2) , 25-34
- https://doi.org/10.1016/0040-6090(85)90091-4
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- The effect of Be and Cr electrode deposition rate on the performance of MIS solar cellsSolar Cells, 1985
- Microstructure trends in metal(aluminum, copper, indium, lead, tin)-metal oxide thin films prepared by reactive ion beam sputter depositionThin Solid Films, 1983
- Defect structure analysis of polycrystalline materials by computer-controlled double-crystal diffractometer with position-sensitive detectorJournal of Applied Crystallography, 1983
- Study of MIS silicon solar cells by ESCA and AESSolar Energy Materials, 1982
- Stability Analysis of Cr-MIS Solar CellsIEEE Transactions on Reliability, 1982
- Study of stability of MIS polycrystalline silicon solar cells by Auger electron spectroscopyJournal of Vacuum Science and Technology, 1981
- Reliability studies on MIS solar cellsApplied Physics A, 1978
- Correlation between the defect structure and electrical properties of deformed Si surfacesJournal of Vacuum Science and Technology, 1978
- Barrier height modification in silicon Schottky (MIS) solar cellsIEEE Transactions on Electron Devices, 1977