On the characterization of a RF parallel plate discharge
- 14 April 1991
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 24 (4) , 593-601
- https://doi.org/10.1088/0022-3727/24/4/010
Abstract
A parallel plate discharge, operated in argon in the pressure range p=0.001 to 1 mbar, was investigated with special interest on the mechanism of power deposition and on the electron energy distribution function (EEDF). Various diagnostic methods were used in combination in order to obtain a sufficient characterization of the discharge. The predominant channel of power flux was found to change with increasing pressure from Joule-type heating in the plasma bulk to heating by beam-like secondary electrons emitted by the powered electrode. Measured EEDFS differ from Maxwellians and change their shape along the discharge axis.Keywords
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