Influence of scribe lane structures on wafer potentials and charging damage
- 7 November 2002
- proceedings article
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Quantifying Wafer Charging During Via EtchPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2005
- Charge Damage Caused by Electron Shading EffectJapanese Journal of Applied Physics, 1994