D.c. dielectric breakdown in SiO2 films prepared by low temperature chemical vapour deposition
- 1 October 1986
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 143 (2) , 109-112
- https://doi.org/10.1016/0040-6090(86)90378-0
Abstract
No abstract availableKeywords
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