Photoelectron diffraction and photoelectron holography study of a Ge(111) high-temperature surface phase transition
- 1 February 1993
- journal article
- Published by Elsevier in Surface Science
- Vol. 281 (3) , 270-284
- https://doi.org/10.1016/0039-6028(93)90640-6
Abstract
No abstract availableKeywords
This publication has 35 references indexed in Scilit:
- Photoelectron-diffraction and photoelectron-holography study of a Ge(111) high-temperature surface phase transitionPhysical Review B, 1992
- Surface diffusion and phase transition on the Ge(111) surface studied by scanning tunneling microscopyPhysical Review Letters, 1991
- Phase transitions on the Ge(111) and Si(111) surfaces from core-level studiesPhysical Review B, 1990
- Photoelectron holography = holography + photoelectron diffractionJournal of Electron Spectroscopy and Related Phenomena, 1990
- Dimer–adatom–stacking-fault (DAS) and non-DAS (111) semiconductor surfaces: A comparison of Ge(111)-c(2×8) to Si(111)-(2×2), -(5×5), -(7×7), and -(9×9) with scanning tunneling microscopyPhysical Review B, 1989
- Surface structure and long-range order of the Ge(111)-c(2×8) reconstructionPhysical Review B, 1988
- Photoelectron HolographyPhysical Review Letters, 1988
- Structure determination of thesurface by medium-energy ion scatteringPhysical Review B, 1988
- A new phase transition at Ge(111) surface observed by low-energy-electron diffractionPhysical Review Letters, 1987
- Photoelectron diffractionPhysica Scripta, 1987