Chemical Vapor Deposition and Properties of Amorphous Aluminum Oxide Films
- 1 January 1996
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Selective Ion Beam Etching of Al2 O 3 FilmsJournal of the Electrochemical Society, 1991
- Aluminum oxide thin films prepared by chemical vapor deposition from aluminum 2-ethylhexanoateApplied Physics Letters, 1991
- A study of aluminum oxide thin films prepared by atmospheric-pressure chemical vapor deposition from trimethylaluminum + oxygen and/or nitrous oxideJournal of Electronic Materials, 1988
- Preparation of alumina coatings by chemical vapour depositionThin Solid Films, 1986
- Electron‐Beam Evaporated Al2 O 3 on SiJournal of the Electrochemical Society, 1975
- Deposition and Properties of Aluminum Oxide Obtained by Pyrolytic Decomposition of an Aluminum AlkoxideJournal of the Electrochemical Society, 1967
- A new insulated-gate silicon transistorProceedings of the IEEE, 1966