Impurity-disordered, coupled-stripe AlxGa1−xAs-GaAs quantum well laser

Abstract
Continuous room‐temperature operation of impurity‐disordered, coupled‐stripe AlxGa1−xAs‐GaAs quantum well heterostructure lasers is described. Silicon (donor) diffusion at 850 °C is used to produce layer disordering and index guiding, in addition to providing carrier confinement in a ten‐stripe coupled array (8‐μm‐wide stripes on 10‐μm centers).