Abstract
Thermally stimulated ionic conductivity measurements have been made of sodium motion through SiO2 grown thermally on silicon, and through thermal SiO2 after bombardment by Ar+, B+, and P+ ions of 5 keV energy. Ion implantation of SiO2 by glass-forming ions such as B+ or P+ creates traps at the SiO2-Al interface that can markedly reduce Na+ motion in SiO2.