INFRARED REFLECTIVITY AND TRANSMISSIVITY OF BORON-IMPLANTED, LASER-ANNEALED SILICON
- 1 January 1980
- book chapter
- Published by Elsevier
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Laser Annealing of Ion-Implanted SemiconductorsScience, 1979
- Laser annealing of boron-implanted siliconApplied Physics Letters, 1978
- Optical constants of various heavily doped p- and n-type silicon crystals obtained by Kramers-Kronig analysisInfrared Physics, 1977