Electrical resistance measurements at high pressure and low temperature using a diamond-anvil cell

Abstract
A new method of measuring electrical resistance in a diamond-anvil cell has been developed. The sample assembly consisting of copper-plate electrodes and polymer film has been used for a modified two-probe method. The resistance measurements have been carried out at pressures up to 250 kbar and temperatures down to 1.7 K using a diamond-anvil cell driven by helium gas. This method has been applied to investigate the pressure-induced phase transition in iodine and superconducting transition in hydrogenated amorphous silicon films.