Catalytic Chemical Vapor Deposition (CTC–CVD) Method Producing High Quality Hydrogenated Amorphous Silicon
- 1 December 1986
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 25 (12A) , L949
- https://doi.org/10.1143/jjap.25.l949
Abstract
A new method of producing high quality hydrogenated amorphous silicon (a-Si:H) films is presented. An SiH4. and H2 gas mixture is decomposed without using any plasmas or photochemical excitation, but using only thermal and catalytic reactions between deposition-gas and a heated tungsten catalyzer. Photoconductivity of films produced by this methodreaches 10-3 (Ωcm)-1 and photosensitivity exceeds 105 for illumination of AM-1 light of 100 mW/cm2.Keywords
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