Effect of a declination angle of substrate position on magnetron sputter deposition from a YBa2Cu3O7−xtarget

Publisher Website
Google Scholar
Abstract
Thin‐film deposition by magnetron sputtering of a multielement target was carried out with respect to the geometrical factors between a target and the substrates. The thin films were deposited on substrates which were located semicircularly over a YBa2Cu3O7−x target in several declination angles measured from the normal to the target surface. The deposition rate decreased to about one‐third with the change in the angle from 0° to 90°. In the angles of 45°, 60°, and 75°, films showed significant instability in the atmosphere, which appeared to be caused by an excessive concentration of Ba atoms in the films. Target composition was almost reproduced in the films deposited in the angle of 90°.