Ultrathin μc-Si films deposited by PECVD
- 1 February 2001
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 383 (1-2) , 7-10
- https://doi.org/10.1016/s0040-6090(00)01595-9
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
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- Highlights of preparative solid state chemistry in low pressure plasmasPublished by Walter de Gruyter GmbH ,1982