Real-time and spectroscopic ellipsometry of film growth: Application to multilayer systems in plasma and CVD processing of semiconductors
- 30 June 1980
- journal article
- Published by Elsevier in Surface Science
- Vol. 96 (1-3) , 275-293
- https://doi.org/10.1016/0039-6028(80)90307-6
Abstract
No abstract availableThis publication has 19 references indexed in Scilit:
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