Characterization of microcrystalline silicon films prepared by the glow discharge method under different deposition conditions
- 1 January 1988
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 156 (2) , 277-286
- https://doi.org/10.1016/0040-6090(88)90322-7
Abstract
No abstract availableKeywords
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