Transport Properties, Microstructure, and Conduction Model of Cosputtered Au–SiO2 Cermet Films
- 15 March 1970
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 41 (4) , 1850-1856
- https://doi.org/10.1063/1.1659114
Abstract
High‐resistivity Au–SiO2 cermet films have been cosputtered. Their transport and structural properties have been examined and a model for electrical conduction is proposed. The electrical resistivity was found to be thermally activated, and the activation energy increased linearly as the metal content decreased. Activation energies varied from 0.01 to 0.07 eV. At a fixed temperature, the resistivity increased exponentially as the weight percent gold decreased. The cermets obeyed Ohm's law. No Hall effect was observed. Transmission electron micrographs showed very small (30–100 Å) discontinuous gold particles separated by very small SiO2 regions. Films were deposited at 20°, 500°, 520°, and 600°C. Gold particle size increased with increasing gold content or with increasing substrate temperature. Only polycrystalline gold was observed by electron diffraction. The typical infrared spectrum of SiO2 was recorded. 20°C cermets annealed at 600°C showed large particle growth and twinning. Electrical conduction in Au–SiO2 cermets is described by a model for conduction in island metal films. Good agreement is obtained between activation energies calculated from measured gold particle diameters and separations, and measured activation energies. From gold particle separations and estimated barrier height, calculations show that charge carriers tunnel through the SiO2. Many other models were considered, but none fit all the experimental relationships.This publication has 22 references indexed in Scilit:
- Electrical and Structural Properties of Mixed Chromium and Silicon Monoxide FilmsJournal of Applied Physics, 1968
- Conduction and Stoichiometry in Heat-Treated, Anodic Oxide FilmsJournal of the Electrochemical Society, 1968
- Electrical Properties of Cr-SiO Cermet FilmsJournal of Applied Physics, 1967
- Correlated Structure in Evaporated Cermet FilmsJournal of Applied Physics, 1967
- CO-SPUTTERED Au-SiO2 CERMET FILMSApplied Physics Letters, 1967
- Photoemission of Electrons from Metals into Silicon DioxideJournal of Applied Physics, 1966
- Photoemission of Electrons from Silicon into Silicon DioxidePhysical Review B, 1965
- Electrical Conduction in Thin Aggregated Metal FilmsNature, 1964
- Electrical Conduction Mechanism in Ultrathin, Evaporated Metal FilmsJournal of Applied Physics, 1962
- Contact Potential Difference Measurements by the Kelvin MethodProceedings of the Physical Society. Section B, 1957