Low-gas-pressure sputtering by means of microwave-enhanced magnetron plasma excited by electron cyclotron resonance
- 5 October 1992
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 61 (14) , 1733-1734
- https://doi.org/10.1063/1.108413
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Production of ions in open-ended region of coaxial-type microwave cavityReview of Scientific Instruments, 1992
- Plasma properties in the open-ended region of a coaxial-type microwave cavityReview of Scientific Instruments, 1991
- Collimated magnetron sputter depositionJournal of Vacuum Science & Technology A, 1991
- Ion beam bombardment effects during films depositionVacuum, 1988