XeCl excimer laser ablation of a polyethersulfone film: Dependence of periodic microstructures on a polarized beam
- 26 November 1990
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 57 (22) , 2368-2370
- https://doi.org/10.1063/1.103873
Abstract
Highly periodic stable microstructures appeared on the surface of polyethersulfone (PES) by XeCl excimer laser ablation with a single polarized beam in ambient air. Its formation mechanism was investigated using the time-resolved light scattering technique with the pulsed light of an XeF excimer laser. In addition to the polarization of the ablating beam, thermal processes on the etched surface play a significant role in microstructure formation.Keywords
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