Fabrication and applications of piezo-and ferroelectric films

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Abstract
Different thin film fabrication techniques of ferro- and piezoelectric materials is described with special emphasis on rf sputtering. The relative advantages and disadvantages of oxide and metallic targets, and the control of stoichiometry by adjusting the target substrate distance and composition of target is described. The possible applications of ferroelectric films in non-volative memories, pyroelectric detectors, electro- and acousto-optic devices is briefly presented. The applications of these films in the fabrication of integrated Surface Acoustic Wave (SAW) devices on Silicon is discussed in some detail. Theoretical calculations of SAW transduction in layered media is used to compare selected ferroelectric (PZT, PbTiO3. LiNbO3 and BaTiO3) and piezoelectric (ZnO, AIN and CdS) films on silicon for their use in SAW devices.