Cl₂/Ar Plasma Etching of a Contaminated Layer on Si Induced by Fluorocarbon Gas Plasma

This publication has 3 references indexed in Scilit:

• Surface Damage on Si Substrates Caused by Reactive Sputter Etching
  Japanese Journal of Applied Physics, 1981
• Si and SiO₂ Etching Characteristics Using Reactive Ion Etching with CF₄-Cl₂ Gas Mixture
  Japanese Journal of Applied Physics, 1980
• Selective Etching of Silicon Dioxide Using Reactive Ion Etching with CF 4 ‐ H 2
  Journal of the Electrochemical Society, 1979