Fabrication of submicrometre parallelogramic-shapedgratings in SiO 2
- 8 December 1994
- journal article
- Published by Institution of Engineering and Technology (IET) in Electronics Letters
- Vol. 30 (25) , 2126-2128
- https://doi.org/10.1049/el:19941443
Abstract
The fabrication process of submicrometre parallelogramic-shaped gratings is reported, which involves an image reversal resist process and a novel oblique reactive ion etching (RIE) configuration. A submicrometre parallelogramic grating with 40° blaze angle is fabricated using this method.Keywords
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