Effect of Substrate Orientation on Interfacial and Bulk Character of Chemically Vapor Deposited Monocrystalline Silicon Carbide Thin Films
- 1 May 1990
- journal article
- Published by Wiley in Journal of the American Ceramic Society
- Vol. 73 (5) , 1289-1296
- https://doi.org/10.1111/j.1151-2916.1990.tb05193.x
Abstract
No abstract availableKeywords
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