Development of mass-production-type plasma chemical vapour deposition equipment and its application to various dies
- 1 January 1992
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 54-55, 604-608
- https://doi.org/10.1016/s0257-8972(07)80091-0
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Influence of temperature on the growth of TiN films by plasma-assisted chemical vapour depositionThin Solid Films, 1988
- Plasma chemical vapor deposition of TiNPlasma Chemistry and Plasma Processing, 1984
- The plasma-assisted chemical vapour deposition of TiC, TiN and TiCxN1−xThin Solid Films, 1981