A review of the growth and structure of thin films of germanium and silicon
- 1 September 1964
- journal article
- review article
- Published by Elsevier in Microelectronics Reliability
- Vol. 3 (2) , 121-138
- https://doi.org/10.1016/0026-2714(64)90246-x
Abstract
No abstract availableThis publication has 84 references indexed in Scilit:
- Preparation of Crystalline Germanium Films on MetalsJournal of Applied Physics, 1963
- Study of Electron Bombardment of Thin FilmsJournal of Applied Physics, 1961
- Textural Properties of Germanium FilmsJournal of Applied Physics, 1961
- Field emission from silicon and germanium; field desorption and surface migrationJournal of Physics and Chemistry of Solids, 1961
- Struktur‐Änderungen von Ge‐Aufdampfschichten im ElektronenmikroskopAnnalen der Physik, 1955
- The Vapor Pressure of Germanium1Journal of the American Chemical Society, 1952
- Sur les propriétés électriques de couches minces de germaniumJournal de Physique et le Radium, 1951
- Das amorphe GermaniumZeitschrift für Naturforschung A, 1951
- On the structure and properties of some metal and metal oxide filmsJournal de Physique et le Radium, 1950
- Die Atomanordnung des amorphen GermaniumZeitschrift für Naturforschung A, 1949