The deposition of silicon from silane in a low-pressure hot-wall system
- 30 April 1982
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 57 (2) , 259-266
- https://doi.org/10.1016/0022-0248(82)90481-x
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Low pressure deposition of polycrystalline silicon from silaneJournal of Crystal Growth, 1981
- Rate-determining reactions and surface species in CVD of silicon III. The SiH4-H2-N2 systemJournal of Crystal Growth, 1981
- Structure and Stability of Low Pressure Chemically Vapor‐Deposited Silicon FilmsJournal of the Electrochemical Society, 1978
- Growth kinetics and capture of impurities during gas phase crystallizationJournal of Crystal Growth, 1977