Rate-determining reactions and surface species in CVD of silicon III. The SiH4-H2-N2 system
- 1 March 1981
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 51 (3) , 443-452
- https://doi.org/10.1016/0022-0248(81)90421-8
Abstract
No abstract availableKeywords
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