The kinetics of the deposition of silicon by silane pyrolysis at low temperatures and atmospheric pressure
- 1 June 1979
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 60 (1) , 19-25
- https://doi.org/10.1016/0040-6090(79)90341-9
Abstract
No abstract availableKeywords
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