The initial growth steps of ultrathin gate oxides
- 30 September 1999
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 48 (1-4) , 17-24
- https://doi.org/10.1016/s0167-9317(99)00329-9
Abstract
No abstract availableFunding Information
- Ministry of Education, Culture, Sports, Science and Technology (10450020)
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