The thermal stability of SiGe films deposited by ultrahigh-vacuum chemical vapor deposition
- 1 August 1991
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 70 (3) , 1416-1420
- https://doi.org/10.1063/1.349551
Abstract
No abstract availableThis publication has 32 references indexed in Scilit:
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