The charging mechanism of insulated electrode in negative-ion implantation
- 1 March 1995
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 96 (1-2) , 43-47
- https://doi.org/10.1016/0168-583x(94)00451-x
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Comparison of Charge-up Phenomena between Negative- and Positive-Ion ImplantationsPublished by Elsevier ,1993
- Mass-separated negative-ion-beam deposition systemReview of Scientific Instruments, 1986
- Wafer charging and beam interactions in ion implantationNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- Recent advances in the field of ion-induced kinetic electron emission from solidsVacuum, 1983