Minimization of thermoelastic stresses in Czochralski grown silicon: application of the integrated system model
- 1 February 1991
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 108 (3-4) , 779-805
- https://doi.org/10.1016/0022-0248(91)90260-c
Abstract
No abstract availableThis publication has 21 references indexed in Scilit:
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