Modeling of a Pulsed-Power SF6 Plasma
- 1 July 1997
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 36 (7S) , 4820-4823
- https://doi.org/10.1143/jjap.36.4820
Abstract
Pulsing the input power has received much attention to eliminate anomalous side wall etching problems in high density discharges. A simple model consisting of mass conservation equations for ions, neutrals, and electrons and a power balance is used to analyze the characteristics of a pulsed-power SF6 plasma. The model shows an abundant production of negative ions in the after glow and a strong modulation of their density and production rate for a wide range of pulse periods and duty ratios. The results suggest that a pulse period of 100–250 µ s with a duty cycle 25–50% is sufficient to maintain low electron temperature and plasma potential and produce a high concentration of negative ions during the off-part of the cycle.Keywords
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