Selective trilayer deposition process for fabricating Nb/Al-AlOx/Nb Josephson tunnel junctions
- 30 May 1994
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 64 (22) , 3042-3044
- https://doi.org/10.1063/1.111371
Abstract
High quality Nb/Al‐AlOx/Nb Josephson tunnel junctions have been fabricated using a novel process named the selective trilayer deposition process. The junction is formed on a patterned Nb underlayer through the lift‐off deposition of a Nb/Al‐AlOx/Nb trilayer. Anodization then provides the insulation between the underlayer and the wiring layer. We show that this easy and simple process is particularly advantageous for the fabrication of many vertically stacked tunnel junctions.Keywords
This publication has 11 references indexed in Scilit:
- Coupled fluxon modes in stacked Nb//Nb long Josephson junctionsPhysical Review B, 1993
- Fabrication of high quality Nb/AlO/sub x/-Al/Nb Josephson junctions. I. Sputtered Nb films for junction electrodesIEEE Transactions on Applied Superconductivity, 1992
- Sub-μm, planarized, Nb-AlOx-Nb Josephson process for 125 mm wafers developed in partnership with Si technologyApplied Physics Letters, 1991
- Nb/AlOx/Nb trilayer process for the fabrication of submicron Josephson junctions and low-noise dc SQUIDsApplied Physics Letters, 1991
- Small Nb/Al-Oxide/Nb Josephson Junction Fabrication Using Lift-Off ProcessesJapanese Journal of Applied Physics, 1987
- Self-aligned contact process for Nb/Al-AlOx/Nb Josephson junctionsApplied Physics Letters, 1986
- Nb/Al-oxide/Nb Tunnel Junctions for Josephson Integrated CircuitsJapanese Journal of Applied Physics, 1986
- High quality refractory Josephson tunnel junctions utilizing thin aluminum layersApplied Physics Letters, 1983
- New fabrication process for Josephson tunnel junctions with (niobium nitride, niobium) double-layered electrodesApplied Physics Letters, 1982
- Selective niobium anodization process for fabricating Josephson tunnel junctionsApplied Physics Letters, 1981