Thin film retardation plate by oblique deposition
- 1 July 1989
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 28 (13) , 2466-2482
- https://doi.org/10.1364/ao.28.002466
Abstract
The birefringent property of obliquely deposited metal oxides was studied with a view to applying it to optical retardation plates. By finding favorable conditions to form transparent films of large retardation and low opacity, we developed homogeneous quarterwave plates with a bilayered structure 60 × 250 mm in size and ~3 μm. thick on glass substrates. These retardation plates can work with a normally incident light based on form birefringence caused by the characteristic anisotropic microstructure inside the film. They showed promising optical properties which can compete with the conventional types of retardation plate.Keywords
This publication has 51 references indexed in Scilit:
- Geometrical factors of argon incorporation in SiO2 films deposited by ion beam sputteringThin Solid Films, 1984
- Optical elements with ultrahigh spatial-frequency surface corrugationsApplied Optics, 1983
- Film thickness distribution at oblique evaporationJournal of Vacuum Science and Technology, 1982
- Magnetic recording media prepared by oblique incidenceIEEE Transactions on Magnetics, 1981
- Optical properties of selectively absorbing chromium films deposited at oblique angle of incidenceSolar Energy Materials, 1981
- An electron diffraction study of oriented crystal growth in gold and copper films condensed in vacuum at oblique vapour incidenceJournal of Physics D: Applied Physics, 1980
- Influence of SiO Film-Thickness on Liquid Crystal OrientationJapanese Journal of Applied Physics, 1980
- Temperature Dependence of Pretilt Angle for Nematic Liquid CrystalsJapanese Journal of Applied Physics, 1978
- Thin film surface orientation for liquid crystalsApplied Physics Letters, 1972
- Stress Anisotropy in Evaporated Iron FilmsJournal of Applied Physics, 1959