Site-Selective Reaction ofwith Second Layer Ga Atoms on the As-richSurface
- 13 July 1998
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 81 (2) , 413-416
- https://doi.org/10.1103/physrevlett.81.413
Abstract
The top layer of the surface consists of rows of As-As dimers. However, our scanning tunneling microscopy study shows that, in the initial adsorption stage, monoenergetic molecules (0.89 eV) react exclusively with the second layer Ga atoms exposed in trenches or at defects on the surface. A simple molecular orbital argument was used to explain the dynamics of forming gallium bromide species at various surface Ga sites.
Keywords
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