Real-time control of reactive ion etching: identification and disturbance rejection
- 30 December 2002
- proceedings article
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- p. 3379-3385
- https://doi.org/10.1109/cdc.1993.325839
Abstract
No abstract availableKeywords
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- Real-time monitoring and control in plasma etchingIEEE Control Systems, 1991
- Optical emission actinometry and spectral line shapes in rf glow dischargesJournal of Applied Physics, 1984
- Multivariable feedback design: Concepts for a classical/modern synthesisIEEE Transactions on Automatic Control, 1981