Composition profiles of CVD platinum and platinum silicide by Auger electron spectroscopy and secondary ion mass spectrometry
- 31 July 1974
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 22 (3) , 293-303
- https://doi.org/10.1016/0040-6090(74)90300-9
Abstract
No abstract availableKeywords
This publication has 18 references indexed in Scilit:
- Quantitative analysis of light elements (nitrogen, carbon, and oxygen) in sputtered tantalum films by Auger electron spectroscopy and secondary ion mass spectrometry (SIMS)Analytical Chemistry, 1974
- Observations on the formation and etching of platinum silicideApplied Physics Letters, 1974
- Selected area and in-depth auger analysis of thin filmsThin Solid Films, 1973
- Secondary ion emission for surface and in-depth analysis of tantalum thin filmsAnalytical Chemistry, 1973
- Chemical Vapor Deposition of Thin-Film PlatinumJournal of the Electrochemical Society, 1973
- Abstract: Recent Advances in Composition Profiling by Simultaneous Sputtering and Auger AnalysisJournal of Vacuum Science and Technology, 1973
- In-depth profiles of phosphorus ion-implanted silicon by Auger spectroscopy and secondary ion emissionSurface Science, 1972
- LEED-Auger investigation of a stable carbide overlayer on a platinum (111) surfaceSurface Science, 1971
- Investigation of Solids by Means of an Ion-Bombardment Mass SpectrometerPublished by Springer Nature ,1969
- On the nature of annealed semiconductor surfacesPhysics Letters A, 1968