Internal stress of vapour-deposited aluminium films: Effect of O2 and water vapour present during film deposition
- 1 May 1990
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 186 (2) , 233-240
- https://doi.org/10.1016/0040-6090(90)90145-4
Abstract
No abstract availableKeywords
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