Critical nature of oxide/interface quality for SiC power devices
- 1 June 1995
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 28 (1-4) , 177-184
- https://doi.org/10.1016/0167-9317(95)00039-b
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Electrical properties of thermal oxide grown using dry oxidation on p-type 6H-silicon carbideApplied Physics Letters, 1994
- SiC MOS interface characteristicsIEEE Transactions on Electron Devices, 1994
- Low-frequency, high-temperature conductance and capacitance measurements on metal-oxide-silicon carbide capacitorsJournal of Applied Physics, 1994
- High-voltage (>1 kV) SiC Schottky barrier diodes with low on-resistancesIEEE Electron Device Letters, 1993
- Comparison of 6H-SiC, 3C-SiC, and Si for power devicesIEEE Transactions on Electron Devices, 1993
- Mobility study on RIE etched silicon surfaces using SF/sub 6//O/sub 2/ gas etchantsIEEE Transactions on Electron Devices, 1993
- Silicon-carbide high-voltage (400 V) Schottky barrier diodesIEEE Electron Device Letters, 1992
- Power semiconductor device figure of merit for high-frequency applicationsIEEE Electron Device Letters, 1989
- High Temperature Operated Enhancement-Type β-SiC MOSFETJapanese Journal of Applied Physics, 1988