Spin deposition of MoSx thin films
- 30 August 1999
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 351 (1-2) , 119-124
- https://doi.org/10.1016/s0040-6090(99)00255-2
Abstract
No abstract availableKeywords
This publication has 23 references indexed in Scilit:
- Electrochemical deposition of MoS2 thin films by reduction of tetrathiomolybdateThin Solid Films, 1996
- Preparation and characterization of molybdenum disulphide catalystsJournal of Materials Science, 1993
- Synthesis of MoS2 Thin Film by Chemical Vapor Deposition Method and Discharge Characteristics as a Cathode of the Lithium Secondary BatteryJournal of the Electrochemical Society, 1992
- A New Chemical Method of Preparing Semiconducting MoX2 (X=S, Se) Thin FilmsJapanese Journal of Applied Physics, 1991
- Interference grating fabrication in spin-coated As2S3 filmsThin Solid Films, 1991
- Sol-to-Gel and Gel-to-Glass Transitions in the As2S3-Amine systemMRS Proceedings, 1988
- Growth and optical characterization of spin-coated As2S3 multilayer thin filmsThin Solid Films, 1987
- Preparation and properties of different types of sputtered MoS2 filmsWear, 1987
- Application of spin-coated As2S3 thin films in a high resolution trilayer resist systemApplied Physics Letters, 1984
- Spin-coated amorphous chalcogenide filmsJournal of Applied Physics, 1982