Dependence of cathode sputtering rate on the current in a glow discharge†

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Abstract
The experimental dependence of cathode sputtering rate W on dischargo current I in a glow discharge for the combination of cathode material nichrome and filling gas neon was investigated with the help of a microbalance method for determining the thickness of films by a quartz oscillator. The experimental results approximate well to a relation of the type W ∼ Im. The dependence of the coefficient m on the gas pressure p in the range from 2 to 35 Torr was also investigated. A theoretical evaluation of the relation W(I) was made, which takes into account the dependence of the number of sputtered particles on the energy of the ions striking the cathode, the back diffusion of the sputtered particles to the cathode surface and the change of the gas density in the cathode region. Good agreement between the theoretical evaluation and the experimental results for the value of coefficient in was obtained. An explanation of the variation of m(p) is given, which is in agreement with some previous investigations by the authors.

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