An investigation of the phosphorus doping mechanism in a-Si by sweep-out experiments
- 20 August 1991
- journal article
- Published by Taylor & Francis in Philosophical Magazine Part B
- Vol. 64 (2) , 245-261
- https://doi.org/10.1080/13642819108207617
Abstract
No abstract availableKeywords
This publication has 21 references indexed in Scilit:
- Role of hydrogen complexes in the metastability of hydrogenated amorphous siliconPhysical Review B, 1990
- Capacitance Studies of Metastable States in Light-Soaked, Quench-Cooled, and Bias-Annealed N-Type Hydrogenated Amorphous SiliconMRS Proceedings, 1990
- Hydrogen bonding and diffusion in crystalline siliconPhysical Review B, 1989
- Preparation-dependent relaxation in n-type a-Si:HPhilosophical Magazine Letters, 1989
- Bias dependence of instability mechanisms in amorphous silicon thin-film transistorsApplied Physics Letters, 1987
- Stretched-exponential relaxation arising from dispersive diffusion of hydrogen in amorphous siliconPhysical Review Letters, 1987
- A chemical-bond approach to doping, compensation and photo-induced degradation in amorphous siliconApplied Physics A, 1986
- Interstitial hydrogen and neutralization of shallow-donor impurities in single-crystal siliconPhysical Review Letters, 1986
- Local bonding configuration of phosphorus in doped and compensated amorphous hydrogenated siliconPhysical Review B, 1983
- Coordination of Arsenic Impurities in Amorphous Silicon-Hydrogen AlloysPhysical Review Letters, 1977