Laminated dry film resist for microengineering applications
- 1 January 1996
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 30 (1-4) , 365-368
- https://doi.org/10.1016/0167-9317(95)00265-0
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Combination of excimer laser micromachining and replication processes suited for large scale productionApplied Surface Science, 1995
- Development of micromachined devices using polyimide-based processesSensors and Actuators A: Physical, 1994
- Galvanoplated 3D structures for micro systemsMicroelectronic Engineering, 1994
- High aspect ratio polyimide etching using an oxygen plasma generated by electron cyclotron resonance sourceJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1994