Surface accumulation of manganese in Si+-implanted and annealed semi-insulating indium phosphide

Publisher Website
Google Scholar
Abstract
Using low‐temperature photoluminescence and secondary ion mass spectrometry measurements, we show here that Mn, a residual impurity, accumulates in a region close to the sample surface in Si+‐ but not in Ar+‐implanted and close contact annealed bulk semi‐insulating (SI) InP(Fe). These results which constitute a first observation on the influence of the electrical nature of the species implanted in InP are tentatively explained using a simple model based on the amphoteric nature of Mn (substitutional and interstitial) and the electric field due to the charge distribution of the implanted impurities.