Deposition of stable, low κ and high deposition rate SiF4-doped TEOS fluorinated silicon dioxide (SiOF) films
- 1 October 1997
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 308-309, 507-511
- https://doi.org/10.1016/s0040-6090(97)00478-1
Abstract
No abstract availableKeywords
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