Surface electronic and atomic structure ofon Si(111)
- 15 October 1995
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 52 (16) , 11932-11937
- https://doi.org/10.1103/physrevb.52.11932
Abstract
The surface atomic and electronic structure of layers epitaxially grown on Si(111) is studied by angle-resolved ultraviolet photoemission spectroscopy. The experimental results are compared to electronic band-structure calculations for various reasonable surface atomic configurations. Satisfactory agreement is obtained for two geometries consisting of reconstructed (0001) surfaces. Both reconstructions involve a buckled Si top layer similar to (111) double layers in bulk Si but differ in their registries with respect to the bulk silicide layer underneath, leading to a silicide surface termination with stoichiometry. In contrast, the calculations clearly show that a surface termination with stoichiometry involving an ordered array of vacancies in the buckled Si top layer would result in a quite different surface electronic structure incompatible with the experimental one. This allows us to rule out this model often invoked in previous work. Finally, models exposing a bulklike flat Si graphitelike top layer, with or without vacancies, can also safely be ruled out on the basis of the present data.
Keywords
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