Abstract
We propose that DX is a negatively charged defect center resulting from the "reaction" 2d0d++DX where d represents a substitutional donor. The results of our pseudopotential calculations for Si- and S-induced DX centers in GaAs indicate large dopant-dependent relaxations leading to threefold-coordinated interstitial sites for either the donor or one of its nearest neighbors. A simple expression for the alloy composition and pressure dependence of the DX binding energy is suggested and used in an analysis of experimental data.