Copper(I) tert-Butyl 3-Oxobutanoate Complexes as Precursors for Chemical Vapor Deposition of Copper
- 14 August 1998
- journal article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 10 (9) , 2326-2328
- https://doi.org/10.1021/cm980343k
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
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